Files in this item
Solvent immersion nanoimprint lithography of fluorescent conjugated polymers
Item metadata
dc.contributor.author | Whitworth, Guy Luke | |
dc.contributor.author | Zhang, Shuyu | |
dc.contributor.author | Stevenson, James Robert Young | |
dc.contributor.author | Ebenhoch, Bernd | |
dc.contributor.author | Samuel, Ifor David William | |
dc.contributor.author | Turnbull, Graham A. | |
dc.date.accessioned | 2015-11-09T15:10:07Z | |
dc.date.available | 2015-11-09T15:10:07Z | |
dc.date.issued | 2015-10-19 | |
dc.identifier | 229672606 | |
dc.identifier | 2ad2a2ad-f2f8-40bf-a059-3b246d1a1880 | |
dc.identifier | 84945151255 | |
dc.identifier | 000363781900034 | |
dc.identifier.citation | Whitworth , G L , Zhang , S , Stevenson , J R Y , Ebenhoch , B , Samuel , I D W & Turnbull , G A 2015 , ' Solvent immersion nanoimprint lithography of fluorescent conjugated polymers ' , Applied Physics Letters , vol. 107 , no. 16 , 163301 . https://doi.org/10.1063/1.4933316 | en |
dc.identifier.issn | 0003-6951 | |
dc.identifier.other | ORCID: /0000-0002-2132-7091/work/31037448 | |
dc.identifier.uri | https://hdl.handle.net/10023/7756 | |
dc.description | This work was supported by Engineering and Physical Sciences Research Council (EPSRC) Programme Grants: (EP1J01771X), (EP/K00042X), (EP/J5005491), and (EP/K503162). | en |
dc.description.abstract | Solvent immersion imprint lithography (SIIL) was used to directly nanostructure conjugated polymer films. The technique was used to create light-emitting diffractive optical elements and organic semiconductor lasers. Gratings with lateral features as small as 70 nm and depths of ∼25 nm were achieved in poly(9,9-dioctylfluorenyl-2,7-diyl). The angular emission from the patterned films was studied, comparing measurement to theoretical predictions. Organic distributed feedback lasers fabricated with SIIL exhibited thresholds for lasing of ∼40 kW/cm2, similar to those made with established nanoimprint processes. The results show that SIIL is a quick, convenient and practical technique for nanopatterning of polymer photonic devices. | |
dc.format.extent | 2664976 | |
dc.language.iso | eng | |
dc.relation.ispartof | Applied Physics Letters | en |
dc.subject | QC Physics | en |
dc.subject | NDAS | en |
dc.subject.lcc | QC | en |
dc.title | Solvent immersion nanoimprint lithography of fluorescent conjugated polymers | en |
dc.type | Journal article | en |
dc.contributor.sponsor | EPSRC | en |
dc.contributor.sponsor | EPSRC | en |
dc.contributor.institution | University of St Andrews. School of Physics and Astronomy | en |
dc.contributor.institution | University of St Andrews. Condensed Matter Physics | en |
dc.identifier.doi | https://doi.org/10.1063/1.4933316 | |
dc.description.status | Peer reviewed | en |
dc.identifier.grantnumber | EP/K00042X/1 | en |
dc.identifier.grantnumber | EP/J01771X/1 | en |
This item appears in the following Collection(s)
Items in the St Andrews Research Repository are protected by copyright, with all rights reserved, unless otherwise indicated.