Solvent immersion nanoimprint lithography of fluorescent conjugated polymers
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Solvent immersion imprint lithography (SIIL) was used to directly nanostructure conjugated polymer films. The technique was used to create light-emitting diffractive optical elements and organic semiconductor lasers. Gratings with lateral features as small as 70 nm and depths of ∼25 nm were achieved in poly(9,9-dioctylfluorenyl-2,7-diyl). The angular emission from the patterned films was studied, comparing measurement to theoretical predictions. Organic distributed feedback lasers fabricated with SIIL exhibited thresholds for lasing of ∼40 kW/cm2, similar to those made with established nanoimprint processes. The results show that SIIL is a quick, convenient and practical technique for nanopatterning of polymer photonic devices.
Whitworth , G L , Zhang , S , Stevenson , J R Y , Ebenhoch , B , Samuel , I D W & Turnbull , G A 2015 , ' Solvent immersion nanoimprint lithography of fluorescent conjugated polymers ' Applied Physics Letters , vol. 107 , no. 16 , 163301 . DOI: 10.1063/1.4933316
Applied Physics Letters
© 2015 AIP Publishing LLC. This work is made available online in accordance with the publisher’s policies. This is the final published version of the work, which was originally published at: http://dx.doi.org/10.1063/1.4933316
DescriptionThis work was supported by Engineering and Physical Sciences Research Council (EPSRC) Programme Grants: (EP1J01771X), (EP/K00042X), (EP/J5005491), and (EP/K503162).
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