Show simple item record

Files in this item

Thumbnail

Item metadata

dc.contributor.authorShamim, Mohammed Zubair Mohammed
dc.contributor.authorPersheyev, Saydulla
dc.contributor.authorZaidi, Monji
dc.contributor.authorUsman, Mohammed
dc.contributor.authorShiblee, Mohammad
dc.contributor.authorAli, Syed Jaffar
dc.contributor.authorRahman, Mohammad Rizwanur
dc.date.accessioned2021-01-24T00:37:16Z
dc.date.available2021-01-24T00:37:16Z
dc.date.issued2020
dc.identifier.citationShamim , M Z M , Persheyev , S , Zaidi , M , Usman , M , Shiblee , M , Ali , S J & Rahman , M R 2020 , ' Micro-nano fabrication of self-aligned silicon electron field emitter arrays using pulsed KrF laser irradiation ' , Integrated Ferroelectrics , vol. 204 , no. 1 , pp. 47-57 . https://doi.org/10.1080/10584587.2019.1674988en
dc.identifier.issn1058-4587
dc.identifier.otherPURE: 266500946
dc.identifier.otherPURE UUID: d147822d-042e-4b63-a186-af0c830709b6
dc.identifier.otherScopus: 85079067040
dc.identifier.otherWOS: 000509120000006
dc.identifier.urihttp://hdl.handle.net/10023/21306
dc.descriptionThe authors gratefully acknowledge the support by the College of Engineering Research Center under the Deanship of Scientific Research of King Khalid University, Saudi Arabia. (Grant No. 98)en
dc.description.abstractSelf-aligned silicon micro-nano structured electron field emitter arrays were fabricated using pulsed krypton fluoride (KrF) excimer laser crystallization (ELC) of hydrogenated amorphous thin silicon films (a-Si:H) on metal coated backplane samples. We investigate the effect of laser processing parameters on the growth of micro-nano conical structures on the surface of the thin silicon films. Randomly oriented conical structures as high as 1 µm were fabricated using laser pulse frequency of 100 Hz and sample stage scanning speed of 0.25 mm/sec. Best field emission (FE) results were measured from samples with the highest surface features with FE currents in the order of 10−6 A and low turn-on emission threshold of ∼14 V/µm. Light emission from the prototype demonstrators was tested using bespoke driver electronics and planar anodes coated with indium tin-oxide (ITO) and medium voltage FE phosphors, to exemplify their usage for future flat panel display technologies.
dc.format.extent11
dc.language.isoeng
dc.relation.ispartofIntegrated Ferroelectricsen
dc.rightsCopyright © 2020 Taylor & Francis Group, LLC. This work has been made available online in accordance with publisher policies or with permission. Permission for further reuse of this content should be sought from the publisher or the rights holder. This is the author created accepted manuscript following peer review and may differ slightly from the final published version. The final published version of this work is available at https://doi.org/10.1080/10584587.2019.1674988.en
dc.subjectElectron field emission displayen
dc.subjectExcimer laser crystallizationen
dc.subjectHydrogenated amorphous siliconen
dc.subjectQC Physicsen
dc.subjectTK Electrical engineering. Electronics Nuclear engineeringen
dc.subjectControl and Systems Engineeringen
dc.subjectElectrical and Electronic Engineeringen
dc.subjectCeramics and Compositesen
dc.subjectElectronic, Optical and Magnetic Materialsen
dc.subjectMaterials Chemistryen
dc.subjectCondensed Matter Physicsen
dc.subjectNDASen
dc.subject.lccQCen
dc.subject.lccTKen
dc.titleMicro-nano fabrication of self-aligned silicon electron field emitter arrays using pulsed KrF laser irradiationen
dc.typeJournal articleen
dc.description.versionPostprinten
dc.contributor.institutionUniversity of St Andrews.Organic Semiconductor Centreen
dc.contributor.institutionUniversity of St Andrews.School of Physics and Astronomyen
dc.identifier.doihttps://doi.org/10.1080/10584587.2019.1674988
dc.description.statusPeer revieweden
dc.date.embargoedUntil2021-01-24


This item appears in the following Collection(s)

Show simple item record