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Micro-nano fabrication of self-aligned silicon electron field emitter arrays using pulsed KrF laser irradiation
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dc.contributor.author | Shamim, Mohammed Zubair Mohammed | |
dc.contributor.author | Persheyev, Saydulla | |
dc.contributor.author | Zaidi, Monji | |
dc.contributor.author | Usman, Mohammed | |
dc.contributor.author | Shiblee, Mohammad | |
dc.contributor.author | Ali, Syed Jaffar | |
dc.contributor.author | Rahman, Mohammad Rizwanur | |
dc.date.accessioned | 2021-01-24T00:37:16Z | |
dc.date.available | 2021-01-24T00:37:16Z | |
dc.date.issued | 2020 | |
dc.identifier | 266500946 | |
dc.identifier | d147822d-042e-4b63-a186-af0c830709b6 | |
dc.identifier | 85079067040 | |
dc.identifier | 000509120000006 | |
dc.identifier.citation | Shamim , M Z M , Persheyev , S , Zaidi , M , Usman , M , Shiblee , M , Ali , S J & Rahman , M R 2020 , ' Micro-nano fabrication of self-aligned silicon electron field emitter arrays using pulsed KrF laser irradiation ' , Integrated Ferroelectrics , vol. 204 , no. 1 , pp. 47-57 . https://doi.org/10.1080/10584587.2019.1674988 | en |
dc.identifier.issn | 1058-4587 | |
dc.identifier.uri | https://hdl.handle.net/10023/21306 | |
dc.description | The authors gratefully acknowledge the support by the College of Engineering Research Center under the Deanship of Scientific Research of King Khalid University, Saudi Arabia. (Grant No. 98) | en |
dc.description.abstract | Self-aligned silicon micro-nano structured electron field emitter arrays were fabricated using pulsed krypton fluoride (KrF) excimer laser crystallization (ELC) of hydrogenated amorphous thin silicon films (a-Si:H) on metal coated backplane samples. We investigate the effect of laser processing parameters on the growth of micro-nano conical structures on the surface of the thin silicon films. Randomly oriented conical structures as high as 1 µm were fabricated using laser pulse frequency of 100 Hz and sample stage scanning speed of 0.25 mm/sec. Best field emission (FE) results were measured from samples with the highest surface features with FE currents in the order of 10−6 A and low turn-on emission threshold of ∼14 V/µm. Light emission from the prototype demonstrators was tested using bespoke driver electronics and planar anodes coated with indium tin-oxide (ITO) and medium voltage FE phosphors, to exemplify their usage for future flat panel display technologies. | |
dc.format.extent | 11 | |
dc.format.extent | 224137 | |
dc.language.iso | eng | |
dc.relation.ispartof | Integrated Ferroelectrics | en |
dc.subject | Electron field emission display | en |
dc.subject | Excimer laser crystallization | en |
dc.subject | Hydrogenated amorphous silicon | en |
dc.subject | QC Physics | en |
dc.subject | TK Electrical engineering. Electronics Nuclear engineering | en |
dc.subject | Control and Systems Engineering | en |
dc.subject | Electrical and Electronic Engineering | en |
dc.subject | Ceramics and Composites | en |
dc.subject | Electronic, Optical and Magnetic Materials | en |
dc.subject | Materials Chemistry | en |
dc.subject | Condensed Matter Physics | en |
dc.subject | NDAS | en |
dc.subject.lcc | QC | en |
dc.subject.lcc | TK | en |
dc.title | Micro-nano fabrication of self-aligned silicon electron field emitter arrays using pulsed KrF laser irradiation | en |
dc.type | Journal article | en |
dc.contributor.institution | University of St Andrews. Organic Semiconductor Centre | en |
dc.contributor.institution | University of St Andrews. School of Physics and Astronomy | en |
dc.identifier.doi | 10.1080/10584587.2019.1674988 | |
dc.description.status | Peer reviewed | en |
dc.date.embargoedUntil | 2021-01-24 |
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