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dc.contributor.authorHarwell, Jonathon
dc.contributor.authorBurch, James
dc.contributor.authorFikouras, Alasdair
dc.contributor.authorGather, Malte C.
dc.contributor.authorDi Falco, Andrea
dc.contributor.authorSamuel, Ifor D. W.
dc.date.accessioned2020-02-22T00:34:40Z
dc.date.available2020-02-22T00:34:40Z
dc.date.issued2019-04-23
dc.identifier258088329
dc.identifiere71eec74-a649-42c4-83f8-616e724439e2
dc.identifier85065336279
dc.identifier000466052900008
dc.identifier.citationHarwell , J , Burch , J , Fikouras , A , Gather , M C , Di Falco , A & Samuel , I D W 2019 , ' Patterning multicolor hybrid perovskite films via top-down lithography ' , ACS Nano , vol. 13 , no. 4 , pp. 3823–3829 . https://doi.org/10.1021/acsnano.8b09592en
dc.identifier.issn1936-0851
dc.identifier.othercrossref: 10.1021/acsnano.8b09592
dc.identifier.otherORCID: /0000-0002-4857-5562/work/55085693
dc.identifier.otherORCID: /0000-0002-7338-8785/work/57821761
dc.identifier.otherORCID: /0000-0002-2508-1965/work/90952153
dc.identifier.urihttps://hdl.handle.net/10023/19515
dc.descriptionThis work was (partially) supported by the European Commission under the European Union’s Horizon 2020 research and innovation programme, project MILEDI (grant agreement no. 779373), and by the Engineering and Physical Sciences Research Council (EPSRC) of the UK Grants EP/M025330/1, EP/L017008/1, and EP/M508214/1.en
dc.description.abstractLead-halide perovskites have attracted great attention due to their excellent optoelectronic properties, with rapid progress being made in their performance as light-emitting diodes (LEDs), photodiodes, and solar cells. Demonstrating large scale, high-resolution patterning of perovskites is a key enabling step to unlock their full potential for a range of optoelectronic applications. However, the development of a successful top-down lithography fabrication procedure has so far been hampered by the incompatibility of perovskite films with the solvents used during lithographic processes. Here, we perform a study on the effect of different lithographic solvents on perovskite films and use this insight to develop photolithography and electron-beam lithography procedures for patterning perovskite films. This procedure uses standard resists at low temperatures and achieves micron-scale features with flat tops. Furthermore, we expand this platform to produce arrays of multicolor pixels for potential commercial perovskite LED display applications.
dc.format.extent727255
dc.language.isoeng
dc.relation.ispartofACS Nanoen
dc.subjectPerovskiteen
dc.subjectLight-emitting diodeen
dc.subjectLithographyen
dc.subjectPatterningen
dc.subjectPhotoluminescenceen
dc.subjectSolution-processeden
dc.subjectMulticoloren
dc.subjectQC Physicsen
dc.subjectT Technologyen
dc.subjectDASen
dc.subjectBDCen
dc.subjectR2Cen
dc.subject.lccQCen
dc.subject.lccTen
dc.titlePatterning multicolor hybrid perovskite films via top-down lithographyen
dc.typeJournal articleen
dc.contributor.sponsorEuropean Commissionen
dc.contributor.sponsorEPSRCen
dc.contributor.sponsorEPSRCen
dc.contributor.institutionUniversity of St Andrews. School of Physics and Astronomyen
dc.contributor.institutionUniversity of St Andrews. Biomedical Sciences Research Complexen
dc.contributor.institutionUniversity of St Andrews. Condensed Matter Physicsen
dc.contributor.institutionUniversity of St Andrews. Centre for Biophotonicsen
dc.identifier.doi10.1021/acsnano.8b09592
dc.description.statusPeer revieweden
dc.date.embargoedUntil2020-02-22
dc.identifier.grantnumber779373en
dc.identifier.grantnumberEP/M025330/1en
dc.identifier.grantnumberep/l017008/1en


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