Patterning multicolor hybrid perovskite films via top-down lithography
Date
23/04/2019Author
Grant ID
779373
EP/M025330/1
ep/l017008/1
Keywords
Metadata
Show full item recordAbstract
Lead-halide perovskites have attracted great attention due to their excellent optoelectronic properties, with rapid progress being made in their performance as light-emitting diodes (LEDs), photodiodes, and solar cells. Demonstrating large scale, high-resolution patterning of perovskites is a key enabling step to unlock their full potential for a range of optoelectronic applications. However, the development of a successful top-down lithography fabrication procedure has so far been hampered by the incompatibility of perovskite films with the solvents used during lithographic processes. Here, we perform a study on the effect of different lithographic solvents on perovskite films and use this insight to develop photolithography and electron-beam lithography procedures for patterning perovskite films. This procedure uses standard resists at low temperatures and achieves micron-scale features with flat tops. Furthermore, we expand this platform to produce arrays of multicolor pixels for potential commercial perovskite LED display applications.
Citation
Harwell , J , Burch , J , Fikouras , A , Gather , M C , Di Falco , A & Samuel , I D W 2019 , ' Patterning multicolor hybrid perovskite films via top-down lithography ' , ACS Nano , vol. 13 , no. 4 , pp. 3823–3829 . https://doi.org/10.1021/acsnano.8b09592
Publication
ACS Nano
Status
Peer reviewed
ISSN
1936-0851Type
Journal article
Description
This work was (partially) supported by the European Commission under the European Union’s Horizon 2020 research and innovation programme, project MILEDI (grant agreement no. 779373), and by the Engineering and Physical Sciences Research Council (EPSRC) of the UK Grants EP/M025330/1, EP/L017008/1, and EP/M508214/1.Collections
Items in the St Andrews Research Repository are protected by copyright, with all rights reserved, unless otherwise indicated.