Patterning multicolor hybrid perovskite films via top-down lithography
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Lead-halide perovskites have attracted great attention due to their excellent optoelectronic properties, with rapid progress being made in their performance as light-emitting diodes (LEDs), photodiodes, and solar cells. Demonstrating large scale, high-resolution patterning of perovskites is a key enabling step to unlock their full potential for a range of optoelectronic applications. However, the development of a successful top-down lithography fabrication procedure has so far been hampered by the incompatibility of perovskite films with the solvents used during lithographic processes. Here, we perform a study on the effect of different lithographic solvents on perovskite films and use this insight to develop photolithography and electron-beam lithography procedures for patterning perovskite films. This procedure uses standard resists at low temperatures and achieves micron-scale features with flat tops. Furthermore, we expand this platform to produce arrays of multicolor pixels for potential commercial perovskite LED display applications.
Harwell , J , Burch , J , Fikouras , A , Gather , M C , Di Falco , A & Samuel , I D W 2019 , ' Patterning multicolor hybrid perovskite films via top-down lithography ' , ACS Nano , vol. 13 , no. 4 , pp. 3823–3829 . https://doi.org/10.1021/acsnano.8b09592
© 2019, American Chemical Society. This work has been made available online in accordance with the publisher's policies. This is the author created accepted version manuscript following peer review and as such may differ slightly from the final published version. The final published version of this work is available at https://doi.org/10.1021/acsnano.8b09592