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dc.contributor.authorShe, Zhe
dc.contributor.authorDi Falco, Andrea
dc.contributor.authorHähner, Georg
dc.contributor.authorBuck, Manfred
dc.date.accessioned2012-07-05T11:31:03Z
dc.date.available2012-07-05T11:31:03Z
dc.date.issued2012-02-06
dc.identifier.citationShe , Z , Di Falco , A , Hähner , G & Buck , M 2012 , ' Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off ' , Beilstein Journal of Nanotechnology , vol. 3 , pp. 101-113 . https://doi.org/10.3762/bjnano.3.11en
dc.identifier.issn2190-4286
dc.identifier.otherPURE: 17996756
dc.identifier.otherPURE UUID: 38a4f194-e172-4392-9a50-e80b4e60d714
dc.identifier.otherScopus: 84856802964
dc.identifier.otherORCID: /0000-0003-1225-7607/work/56861219
dc.identifier.otherORCID: /0000-0002-7338-8785/work/57821796
dc.identifier.otherORCID: /0000-0002-6765-344X/work/60426725
dc.identifier.urihttp://hdl.handle.net/10023/2933
dc.description.abstractSelf-assembled monolayers (SAMs) of 4'-methylbiphenyl-4-thiol (MBP0) adsorbed on polycrystalline gold substrates served as templates to control electrochemical deposition of Cu structures from acidic solution, and enabled the subsequent lift-off of the metal structures by attachment to epoxy glue. By exploiting the negative-resist behaviour of MBP0, the SAM was patterned by means of electron-beam lithography. For high deposition contrast a two-step procedure was employed involving a nucleation phase around −0.7 V versus Cu2+/Cu and a growth phase at around −0.35 V versus Cu2+/Cu. Structures with features down to 100 nm were deposited and transferred with high fidelity. By using substrates with different surface morphologies, AFM measurements revealed that the roughness of the substrate is a crucial factor but not the only one determining the roughness of the copper surface that is exposed after lift-off.
dc.language.isoeng
dc.relation.ispartofBeilstein Journal of Nanotechnologyen
dc.rights© 2012 She et al; licensee Beilstein-Institut. This is an Open Access article under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.en
dc.subjectElectrochemical nanotechnologyen
dc.subjectElectrodepositionen
dc.subjectLithographyen
dc.subjectMetallic nanostructuresen
dc.subjectSelf-assembled monolayersen
dc.subjectThiolsen
dc.subjectQD Chemistryen
dc.subjectQC Physicsen
dc.subject.lccQDen
dc.subject.lccQCen
dc.titleElectron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-offen
dc.typeJournal articleen
dc.description.versionPublisher PDFen
dc.contributor.institutionUniversity of St Andrews.School of Chemistryen
dc.contributor.institutionUniversity of St Andrews.School of Physics and Astronomyen
dc.contributor.institutionUniversity of St Andrews.EaSTCHEMen
dc.identifier.doihttps://doi.org/10.3762/bjnano.3.11
dc.description.statusPeer revieweden


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