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Mixed chiral and achiral character in substituted ethane : a next generation QTAIM perspective
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dc.contributor.author | Li, Zi | |
dc.contributor.author | Xu, Tianlv | |
dc.contributor.author | Früchtl, Herbert | |
dc.contributor.author | van Mourik, Tanja | |
dc.contributor.author | Kirk, Steven R. | |
dc.contributor.author | Jenkins, Samantha | |
dc.date.accessioned | 2023-07-11T23:37:55Z | |
dc.date.available | 2023-07-11T23:37:55Z | |
dc.date.issued | 2022-09-16 | |
dc.identifier | 280572342 | |
dc.identifier | 5e7d92f6-a643-4a96-97cd-7d7d224c76ae | |
dc.identifier | 85133843428 | |
dc.identifier | 000884411100002 | |
dc.identifier.citation | Li , Z , Xu , T , Früchtl , H , van Mourik , T , Kirk , S R & Jenkins , S 2022 , ' Mixed chiral and achiral character in substituted ethane : a next generation QTAIM perspective ' , Chemical Physics Letters , vol. 803 , 139762 . https://doi.org/10.1016/j.cplett.2022.139762 | en |
dc.identifier.issn | 0009-2614 | |
dc.identifier.other | RIS: urn:C03B615573EEAA2081FE384E59B6E020 | |
dc.identifier.other | ORCID: /0000-0001-7683-3293/work/116598016 | |
dc.identifier.other | ORCID: /0000-0001-6647-4266/work/116910224 | |
dc.identifier.uri | https://hdl.handle.net/10023/27939 | |
dc.description | Funding: The National Natural Science Foundation of China is gratefully acknowledged, project approval number: 21673071. The One Hundred Talents Foundation of Hunan Province is also gratefully acknowledged for the support of S.J. and S.R.K. H.F. and T.v.M. gratefully acknowledge computational support via the EaStCHEM Research Computing Facility. | en |
dc.description.abstract | We use the newly introduced spanning stress tensor trajectory Uσ-space construction within next generation quantum theory of atoms in molecules (NG-QTAIM) for a chirality investigation of singly and doubly substituted ethane with halogen substituents: F, Cl, Br. Singly substituted ethane was overall achiral comprising cancelling chiral components in Uσ-space. The resultant axial bond critical point (BCP) sliding responded more strongly to the increase in atomic number of the substituted halogen than the chirality. The presence of the very light F atom was found responsible for a very high degree of achiral character of the doubly substituted ethane. | |
dc.format.extent | 8 | |
dc.format.extent | 1446051 | |
dc.format.extent | 3078599 | |
dc.language.iso | eng | |
dc.relation.ispartof | Chemical Physics Letters | en |
dc.subject | Achiral | en |
dc.subject | Chiral | en |
dc.subject | Ethane | en |
dc.subject | Next Generation QTAIM | en |
dc.subject | Halogen | en |
dc.subject | QD Chemistry | en |
dc.subject | NDAS | en |
dc.subject | MCC | en |
dc.subject.lcc | QD | en |
dc.title | Mixed chiral and achiral character in substituted ethane : a next generation QTAIM perspective | en |
dc.type | Journal article | en |
dc.contributor.institution | University of St Andrews. School of Chemistry | en |
dc.contributor.institution | University of St Andrews. Centre for Research into Equality, Diversity & Inclusion | en |
dc.contributor.institution | University of St Andrews. EaSTCHEM | en |
dc.identifier.doi | 10.1016/j.cplett.2022.139762 | |
dc.description.status | Peer reviewed | en |
dc.date.embargoedUntil | 2023-07-12 | |
dc.identifier.url | https://arxiv.org/abs/2204.01260 | en |
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