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dc.contributor.authorAitchison, Hannah
dc.contributor.authorMeyerbroker, Nikolaus
dc.contributor.authorLee, Tien-Lin
dc.contributor.authorZegenhagen, Jörg
dc.contributor.authorPotter, Thomas
dc.contributor.authorFrüchtl, Herbert A.
dc.contributor.authorCebula, Izabela
dc.contributor.authorBuck, Manfred
dc.identifier.citationAitchison , H , Meyerbroker , N , Lee , T-L , Zegenhagen , J , Potter , T , Früchtl , H A , Cebula , I & Buck , M 2017 , ' Underpotential deposition of Cu on Au(111) from neutral chloride containing electrolyte ' , Physical Chemistry Chemical Physics , vol. 19 , no. 35 , pp. 24146-24153 .
dc.identifier.otherPURE: 250912528
dc.identifier.otherPURE UUID: af2e89b4-0515-4d64-909d-88158bc6de1a
dc.identifier.otherBibtex: urn:581e21d441fd945b6c52fe71a1470609
dc.identifier.otherScopus: 85029529328
dc.identifier.otherORCID: /0000-0003-1225-7607/work/56861223
dc.identifier.otherWOS: 000410585900061
dc.identifier.otherORCID: /0000-0001-6647-4266/work/60887505
dc.descriptionSupport by the Leverhulme Trust (RGP-2013-177) and EPSRC via a doctoral training grant (H.A.) is gratefully acknowledged.en
dc.description.abstractThe structure of a chloride terminated copper monolayer electrodeposited onto Au(111) from a CuSO4/KCl electrolyte was investigated ex situ by three complementary experimental techniques (scanning tunneling microscopy (STM), photoelectron spectroscopy (PES), X-ray standing wave (XSW) excitation) and density functional theory (DFT) calculations. STM at atomic resolution reveals a stable, highly ordered layer which exhibits a Moire structure and is described by a (5×5) unit cell. The XSW/PES data yield a well-defined position of the Cu layer and the value of 2.16 A above the topmost Au layer suggests that the atoms are adsorbed in threefold hollow sites. The chloride exhibits some distribution around a distance of 3.77 Å in agreement with the observed Moire pattern due to a higher order commensurate lattice. This structure, a high order commensurate Cl overlayer on top of a commensurate (1×1) Cu layer with Cu at threefold hollow sites, is corroborated by the DFT calculations.
dc.relation.ispartofPhysical Chemistry Chemical Physicsen
dc.rights© 2017 the Authors. This work has been made available online in accordance with the publisher’s policies. This is the author created accepted version manuscript following peer review and as such may differ slightly from the final published version. The final published version of this work is available at:
dc.subjectQD Chemistryen
dc.titleUnderpotential deposition of Cu on Au(111) from neutral chloride containing electrolyteen
dc.typeJournal articleen
dc.contributor.institutionUniversity of St Andrews.School of Chemistryen
dc.contributor.institutionUniversity of St Andrews.EaSTCHEMen
dc.description.statusPeer revieweden

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