1.9 µm waveguide laser fabricated by ultrafast laser inscription in Tm:Lu2O3 ceramic
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The ultrafast laser inscription technique has been used to fabricate channel waveguides in Tm3+-doped Lu2O3 ceramic gain medium for the first time to our knowledge. Laser operation has been demonstrated using a monolithic microchip cavity with a continuous-wave Ti:sapphire pump source at 796 nm. The maximum output power achieved from the Tm:Lu2O3 waveguide laser was 81 mW at 1942 nm. A maximum slope efficiency of 9.5% was measured with the laser thresholds observed to be in the range of 50-200 mW of absorbed pump power. Propagation losses for this waveguide structure are calculated to be 0.7 dB⋅cm−1 ± 0.3 dB⋅cm−1at the lasing wavelength.
Morris , J , Stevenson , N K , Bookey , H T , Kar , A K , Brown , C T A , Hopkins , J -M , Dawson , M D & Lagatsky , A A 2017 , ' 1.9 µm waveguide laser fabricated by ultrafast laser inscription in Tm:Lu 2 O 3 ceramic ' Optics Express , vol. 25 , no. 13 , pp. 14910-14917 . https://doi.org/10.1364/OE.25.014910
© 2017, Optical Society of America. This work has been made available online in accordance with the publisher’s policies. This is the author created, accepted version manuscript following peer review and may differ slightly from the final published version. The final published version of this work is available at www.osapublishing.org / https://doi.org/10.1364/OE.25.014910
DescriptionFunding: UK Engineering and Physical Sciences Research Council (EPSRC) (EP/G037523/1, EP/L01596X/1).
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