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  • High speed e-beam writing for large area photonic nanostructures—a choice of parameters 

    Li, Kezheng; Li, Juntao; Reardon, Christopher; Schuster, Christian S.; Wang, Yue; Triggs, Graham J.; Damnik, Niklas; Muënchenberger, Jana; Wang, Xuehua; Martins, Emiliano R.; Krauss, Thomas F. (2016-09-16) - Journal article
    Photonic nanostructures are used for many optical systems and applications. However, some high-end applications require the use of electron-beam lithography (EBL) to generate such nanostructures. An important technological ...